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- 廣田,幸弘 (ヒロタ,ユキヒロ) https://www.lib.hokudai.ac.jp/dissertations/list/?FF=4&LANG=en&ACCN=1201603457
Title in Japanese | 窒化燐絶縁膜の形成とInP MISFET素子への応用に関する研究 |
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Year of conferral of degrees | 1988 |
Type of degree / Kind of academic degree | 2(論文博士) / 016(工学博士) |
Report number | 3457 |
Date of conferral of degrees | 1988-09-30 |
The primary examiner / A deputy examiner | 佐久間,哲郎 / 中山,恒義 長谷川,英機 阿部,寛 |
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