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  1. 前田,正彦 (マエダ,マサヒコ)
    2. https://www.lib.hokudai.ac.jp/dissertations/list/?FF=4&LANG=en&ACCN=1201603076
    Title in JapaneseCVD法およびプラズマCVD法によるSi系絶縁薄膜形成法の研究
    Title in English
    Year of conferral of degrees1986
    Type of degree / Kind of academic degree2（論文博士） / 016（工学博士）
    Report number3076
    Date of conferral of degrees1986-09-30
    The primary examiner / A deputy examiner長谷川,英機 / 田頭,博昭　小川,吉彦　佐藤,敏一　松本,伍良
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